Experimental Study of Random Telegraph Noise in Trigate Nanowire MOSFETs

Random telegraph noise (RTN) in trigate nanowire transistors (NW Tr.) is systematically studied with respect to the NW size dependence. Time to capture and emission, which is related to the characteristic of the traps, such as trap energy, is independent of NW size. On the other hand, noise amplitude increases as the NW size decreases showing the similar size dependence to the reported scaled planar Tr. In addition, RTN after hot-carrier injection (HCI) and negative bias stress (NBS) is studied. HCI and NBS induce additional carrier traps, which generate larger noise signals. Since the degradation by HCI or NBS is larger with narrower width, RTN after these stresses is found to be severer in the NW Tr.