DocumentCode
3607032
Title
On Temperature Dependency of Steep Subthreshold Slope in Dual-Independent-Gate FinFET
Author
Jian Zhang ; Trommer, Jens ; Weber, Walter Michael ; Gaillardon, Pierre-Emmanuel ; De Micheli, Giovanni
Author_Institution
Integrated Syst. Lab., Ecole Polytech. Fed. de Lausanne, Lausanne, Switzerland
Volume
3
Issue
6
fYear
2015
Firstpage
452
Lastpage
456
Abstract
Dual-independent-gate silicon FinFET has demonstrated a steep subthreshold slope (SS) when a positive feedback induced by weak impact ionization is triggered. In this paper, we study the temperature dependency of the steep SS by characterizing the fabricated device from 100 to 380 K. The measured characteristics of SS show a reduced sensitivity to temperature as compared to conventional MOSFETs. Based on the temperature-dependent characterization, we further analyze the steep-SS characteristics and propose feasible improvements for optimizing the device performance.
Keywords
MOSFET; feedback; impact ionisation; MOSFET; dual-independent-gate FinFET; impact ionization; positive feedback; steep subthreshold slope; temperature 100 K to 380 K; temperature dependent characterization; Feedback; FinFETs; Impact ionization; Schottky barriers; FinFET; Schottky barrier; feedback; impact ionization; steep subthreshold slope;
fLanguage
English
Journal_Title
Electron Devices Society, IEEE Journal of the
Publisher
ieee
ISSN
2168-6734
Type
jour
DOI
10.1109/JEDS.2015.2482123
Filename
7276989
Link To Document