DocumentCode
3607644
Title
High mobility transparent flexible nickel-doped zinc oxide thin-film transistors with small subthreshold swing
Author
Lingling Huang ; Dedong Han ; Yi Zhang ; Pan Shi ; Wen Yu ; Guodong Cui ; Yingying Cong ; Junchen Dong ; Shengdong Zhang ; Xing Zhang ; Yi Wang
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
Volume
51
Issue
20
fYear
2015
Firstpage
1595
Lastpage
1596
Abstract
High-mobility nickel (Ni)-doped zinc oxide thin-film transistors (NZO TFTs) have been successfully fabricated on flexible transparent plastic substrates at a low temperature. The devices all exhibited good electrical properties with small subthreshold swing (SS) and high saturation mobility fabricated under different sputtering pressure (0.4, 0.8, 1.2, 1.6 Pa) during channel deposition by RF magnetron sputtering were found. The electrical properties of NZO TFTs reached the best when the sputtering pressure was 1.6 Pa, with an SS of 89 mV/decade, a saturation mobility of 172 cm2·V-1·s-1, a drain current on/off ratio of 108, and a positive threshold voltage of 2.36 V. The results show that Ni-doped ZnO is a promising candidate for flexible fully transparent displays.
Keywords
flexible displays; high electron mobility transistors; nickel; plastics; semiconductor doping; sputtering; substrates; thin film transistors; zinc compounds; NZO TFT; RF magnetron sputtering; SS; ZnO:Ni; channel deposition; drain current; electrical property; flexible fully transparent display; flexible transparent plastic substrate; high mobility transparent flexible nickel doped zinc oxide thin-film transistor; positive threshold voltage; pressure 0.4 Pa; pressure 0.8 Pa; pressure 1.2 Pa; pressure 1.6 Pa; saturation mobility; small subthreshold swing; sputtering pressure; voltage 2.36 V;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2015.2041
Filename
7289495
Link To Document