DocumentCode
3608159
Title
General Geometric Fluctuation Modeling for Device Variability Analysis
Author
Bo Fu ; Seonghoon Jin ; Woosung Choi ; Keun-Ho Lee ; Young-Kwan Park
Author_Institution
Device Lab., Samsung Semicond., Inc., San Jose, CA, USA
Volume
62
Issue
11
fYear
2015
Firstpage
3588
Lastpage
3594
Abstract
We propose a new modeling approach based on the impedance field method (IFM) to analyze the general geometric variations in device simulations. Compared with the direct modeling of multiple variational devices, the proposed geometric variation (GV) model shows a better efficiency thanks to its IFM-based nature. Compared with the existing random geometric fluctuation (RGF) model where the noise sources are limited to the interfaces, the present GV model provides better accuracy and wider application areas as it transforms the geometric variation into global mesh deformation and computes the noise sources induced by the geometric variation in the whole simulation domain. GV model also provides great insights into the device by providing the effective noise sources, equationwise contributions, and sensitivity maps that are useful for device characterization and optimization.
Keywords
semiconductor device models; GV model; IFM; RGF model; device simulation; device variability analysis; general geometric fluctuation modeling; geometric variation model; global mesh deformation; impedance field method; random geometric fluctuation model; FinFETs; Logic gates; Mathematical model; Noise; Numerical models; Semiconductor device modeling; Silicon; Fluctuations; Fluctuations.; Geometry; MOSFET; Semiconductor device modeling; Semiconductor device noise;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2480013
Filename
7296662
Link To Document