• DocumentCode
    3608159
  • Title

    General Geometric Fluctuation Modeling for Device Variability Analysis

  • Author

    Bo Fu ; Seonghoon Jin ; Woosung Choi ; Keun-Ho Lee ; Young-Kwan Park

  • Author_Institution
    Device Lab., Samsung Semicond., Inc., San Jose, CA, USA
  • Volume
    62
  • Issue
    11
  • fYear
    2015
  • Firstpage
    3588
  • Lastpage
    3594
  • Abstract
    We propose a new modeling approach based on the impedance field method (IFM) to analyze the general geometric variations in device simulations. Compared with the direct modeling of multiple variational devices, the proposed geometric variation (GV) model shows a better efficiency thanks to its IFM-based nature. Compared with the existing random geometric fluctuation (RGF) model where the noise sources are limited to the interfaces, the present GV model provides better accuracy and wider application areas as it transforms the geometric variation into global mesh deformation and computes the noise sources induced by the geometric variation in the whole simulation domain. GV model also provides great insights into the device by providing the effective noise sources, equationwise contributions, and sensitivity maps that are useful for device characterization and optimization.
  • Keywords
    semiconductor device models; GV model; IFM; RGF model; device simulation; device variability analysis; general geometric fluctuation modeling; geometric variation model; global mesh deformation; impedance field method; random geometric fluctuation model; FinFETs; Logic gates; Mathematical model; Noise; Numerical models; Semiconductor device modeling; Silicon; Fluctuations; Fluctuations.; Geometry; MOSFET; Semiconductor device modeling; Semiconductor device noise;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2015.2480013
  • Filename
    7296662