• DocumentCode
    3610786
  • Title

    A High-Vacuum High-Electric-Field Pulsed Power Interface Based on a Ceramic Insulator

  • Author

    Tao Xun ; Han-Wu Yang ; Jian-De Zhang

  • Author_Institution
    Nat. Univ. of Defense Technol., Changsha, China
  • Volume
    43
  • Issue
    12
  • fYear
    2015
  • Firstpage
    4130
  • Lastpage
    4135
  • Abstract
    Improving the flashover voltage in a vacuum interface between a pulsed power system and a vacuum region has been a goal for many years. The interface problem is difficult because of the electrical, mechanical, and vacuum issues that must be satisfied simultaneously. In this paper, according to the theories of vacuum flashover and the design rules for high-electric-field insulators, a ceramic-insulated vacuum interface is presented. The electrostatic field along the ceramic surface was obtained by ANSYS simulations. By optimizing the field shaper and shielding rings, the electric fields were well distributed and the fields around the cathode and anode triple junctions were effectively controlled. The high-voltage test was carried out on an ~600-kV, ~100-ns pulser, and the results show that the vacuum interface can work stably with a holdoff E-field stress of 40 kV/cm. The experimental results agree with the theoretical and simulated results. Finally, the influence of the surface treatment on the ceramic flashover characteristics was also discussed.
  • Keywords
    ceramic insulators; flashover; plasma simulation; surface treatment; ANSYS simulations; anode triple junctions; cathode triple junctions; ceramic-insulated vacuum interface; electrostatic field; high-electric-field insulators; high-vacuum high-electric-field pulsed power interface; high-voltage test; holdoff E-field stress; surface treatment; vacuum flashover voltage; Ceramics; Flashover; Insulators; Pulsed power supplies; Surface treatment; Vacuum technology; Ceramic insulator; pulsed power; surface treatment; vacuum flashover; vacuum flashover.;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2015.2497276
  • Filename
    7331319