• DocumentCode
    3614922
  • Title

    Improvements in photo-plot based reticle fabrication

  • Author

    N. Dumbravescu

  • Author_Institution
    Nat. Inst. for R&D in Microtechnologies - IMT, Bucharest, Romania
  • Volume
    1
  • fYear
    2003
  • fDate
    6/25/1905 12:00:00 AM
  • Firstpage
    171
  • Abstract
    The paper reports on the specific problems occurring at photo-plot type reticles used in mask fabrication for the microtechnology field. The basic limitations of this cheap way to obtain masks for rapid prototyping in micro-optics, microelectronics and micromechanics are pointed out. New methods, applied by the author, to optimize the photo-plot based reticle fabrication are proposed, too.
  • Keywords
    "Optical device fabrication","Laser beams","Buffer storage","Optical films","Writing","Laser theory","Research and development","Paper technology","Prototypes","Microelectronics"
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 2003. CAS 2003. International
  • Print_ISBN
    0-7803-7821-0
  • Type

    conf

  • DOI
    10.1109/SMICND.2003.1251371
  • Filename
    1251371
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3614922