DocumentCode :
3619511
Title :
High Voltage MOS Transistor with a Folded n- Region for Flash Technology
Author :
F. Hofmann;W. Rosner;E. Landgraf
Author_Institution :
Infineon Technologies AG, Munich, Germany
fYear :
2000
fDate :
6/22/1905 12:00:00 AM
Firstpage :
232
Lastpage :
235
Keywords :
"Voltage","MOSFETs","Flash memory","Etching","Nonvolatile memory","Logic devices","Resists","MOS devices","EPROM","Charge pumps"
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2000. Proceeding of the 30th European
Print_ISBN :
2-86332-248-6
Type :
conf
DOI :
10.1109/ESSDERC.2000.194757
Filename :
1503687
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3619511