• DocumentCode
    3619663
  • Title

    Characterization of ultra thin high K gate dielectrics by grazing x-ray reflectance and Spectroscopic Ellipsometry on the same instrument

  • Author

    P. Boher;J.-L. Stehle;C. Defranoux;S. Bourtault;J.-P. Piel;P. Evrard

  • Author_Institution
    SOPRA SA, Bois-Colombes, France
  • fYear
    2001
  • fDate
    6/23/1905 12:00:00 AM
  • Firstpage
    391
  • Lastpage
    394
  • Keywords
    "High K dielectric materials","High-K gate dielectrics","Reflectivity","Electrochemical impedance spectroscopy","Ellipsometry","Instruments","Optical films","Optical refraction","Optical sensors","Silicon"
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 2001. Proceeding of the 31st European
  • Print_ISBN
    2-914601-01-8
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2001.195283
  • Filename
    1506665
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3619663