DocumentCode :
3624068
Title :
SiON Gate Dielectric Reliability
Author :
Paul Nicollian
Author_Institution :
TI
fYear :
2006
Firstpage :
217
Lastpage :
217
Keywords :
"Dielectrics","Electromigration","Electronic design automation and methodology","Negative bias temperature instability","CMOS technology","Integrated circuit reliability","Integrated circuit interconnections"
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2006 IEEE International
ISSN :
1930-8841
Print_ISBN :
1-4244-0296-4
Electronic_ISBN :
2374-8036
Type :
conf
DOI :
10.1109/IRWS.2006.305254
Filename :
4098731
Link To Document :
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