• DocumentCode
    3639445
  • Title

    Constitutive equation of the dipole layer in hydrogen-sensing metal-oxide-semiconductor structures

  • Author

    F. Šrobár;Olga Procházková

  • Author_Institution
    Institute of Photonics and Electronics, Academy of Sciences of the Czech Republic, Chaberská
  • fYear
    2010
  • Firstpage
    275
  • Lastpage
    278
  • Abstract
    Essential part of MOS-based hydrogen sensors is constituted by a dipole layer of polarized H atoms at the metal-oxide interface. This layer decreases barrier height of the Schottky diodes or causes a shift in the threshold voltage of the FET devices. Constitutive P - E (dielectric polarization versus external electric field intensity) equation of the dipole ensemble is derived supposing Langmuir-type hydrogen absorption and a two-valley model of the elementary dipole potential energy. Depending on the energy difference of the minima, the P - E isotherms suggest a rather sudden flip of the dipole orientation from antiparallel to parallel with respect to the E vector. Rabi resonance experiments could be based on this phenomenon, providing information about the adsorbed hydrogen atoms. Dependences of polarization on parameters of the potential profile and on temperature at selected E values are also presented.
  • Keywords
    "Atomic layer deposition","Mathematical model","Metals","Temperature sensors","Equations","Electric fields"
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
  • Print_ISBN
    978-1-4244-8574-1
  • Type

    conf

  • DOI
    10.1109/ASDAM.2010.5667006
  • Filename
    5667006