DocumentCode :
3639445
Title :
Constitutive equation of the dipole layer in hydrogen-sensing metal-oxide-semiconductor structures
Author :
F. Šrobár;Olga Procházková
Author_Institution :
Institute of Photonics and Electronics, Academy of Sciences of the Czech Republic, Chaberská
fYear :
2010
Firstpage :
275
Lastpage :
278
Abstract :
Essential part of MOS-based hydrogen sensors is constituted by a dipole layer of polarized H atoms at the metal-oxide interface. This layer decreases barrier height of the Schottky diodes or causes a shift in the threshold voltage of the FET devices. Constitutive P - E (dielectric polarization versus external electric field intensity) equation of the dipole ensemble is derived supposing Langmuir-type hydrogen absorption and a two-valley model of the elementary dipole potential energy. Depending on the energy difference of the minima, the P - E isotherms suggest a rather sudden flip of the dipole orientation from antiparallel to parallel with respect to the E vector. Rabi resonance experiments could be based on this phenomenon, providing information about the adsorbed hydrogen atoms. Dependences of polarization on parameters of the potential profile and on temperature at selected E values are also presented.
Keywords :
"Atomic layer deposition","Mathematical model","Metals","Temperature sensors","Equations","Electric fields"
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
Print_ISBN :
978-1-4244-8574-1
Type :
conf
DOI :
10.1109/ASDAM.2010.5667006
Filename :
5667006
Link To Document :
بازگشت