DocumentCode :
3647812
Title :
Optical properties of TiN thin films for microelectronic applications
Author :
M. Zlatanovic;D. Sesum;D. Dukic
Author_Institution :
Fac. of Electr. Eng., Belgrade Univ., Serbia
Volume :
1
fYear :
1997
Firstpage :
205
Abstract :
TiN thin films deposited in a d.c. reactive magnetron deposition system were investigated for correlation between optical reflectivity and film structure and composition in order to evaluate the variations in their electrical resistivity. Spectrophotometry, ellipsometry and XRD techniques were used.
Keywords :
"Optical films","Tin","Microelectronics","Reflectivity","Ellipsometry","Conductive films","Particle measurements","Optical materials","Electric variables measurement","Substrates"
Publisher :
ieee
Conference_Titel :
Microelectronics, 1997. Proceedings., 1997 21st International Conference on
Print_ISBN :
0-7803-3664-X
Type :
conf
DOI :
10.1109/ICMEL.1997.625217
Filename :
625217
Link To Document :
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