DocumentCode :
3664798
Title :
Broadband highly linear high isolation SPDT switch IC with floating body technique in 180-nm CMOS
Author :
Xiao Xu;Xin Yang;Taufiq Alif Kurniawan;Toshihiko Yoshimasu
Author_Institution :
The Graduate School of Information, Production and Systems, Waseda University, 2-7 Hibikino Wakamatsu-ku Kitakyushu-city, Fukuoka, Japan
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
653
Lastpage :
655
Abstract :
This paper presents a broadband single-pole double-throw (SPDT) switch IC in a 180-nm CMOS process. Floating body technique and stacked nMOSFETs are utilized to improve the power handling capability and isolation performance. The fabricated SPDT switch IC has exhibited an input referred 0.5-dB compression point of 21.8 dBm, an isolation of 42.4 dB and an insertion loss of 1.2 dB for transmit mode at an operation frequency of 5.0 GHz. The SPDT switch IC has an insertion loss of 2.1 dB and a return loss of 10.6 dB for receive mode at 5.0 GHz.
Keywords :
"Conferences","Electron devices","Solid state circuits"
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2015 IEEE International Conference on
Print_ISBN :
978-1-4799-8362-9
Type :
conf
DOI :
10.1109/EDSSC.2015.7285200
Filename :
7285200
Link To Document :
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