DocumentCode
3667153
Title
Ultimate absolute hooge parameter for semiconductors and graphene
Author
Hiroshi Ohya;Munecazu Tacano;Jan Pavelka;Josef Šikula;Toshimitsu Musha
Author_Institution
Meisei University, 2-1-1 Hodokubo, Hino, Tokyo, 191-8506, Japan
fYear
2015
fDate
6/1/2015 12:00:00 AM
Firstpage
1
Lastpage
4
Abstract
The temperature dependence of the Hooge parameter alfaH for both n- and p-type InGaAs heterostructures with as-grown non-alloyed ohmic contacts shows good agreement with that estimated from the harmonic coupling model; alfaH is given by aa/lambda, where aa is the lattice constant and lambda is the mean free path of the semiconductor material. Experimental results for several other semiconducting materials normalized by the mobility ratio also verify the validity of the model. We are now able to estimate the Hooge parameter theoretically from only the material parameters, whereas the experimental results are scattered over several orders of magnitude.
Keywords
"1f noise","Indium gallium arsenide","Temperature dependence","Temperature measurement","Ohmic contacts","Scattering"
Publisher
ieee
Conference_Titel
Noise and Fluctuations (ICNF), 2015 International Conference on
Type
conf
DOI
10.1109/ICNF.2015.7288565
Filename
7288565
Link To Document