Title :
Dielectric material for monolayer black phosphorus transistors: A first-principles investigation
Author :
Qing Shi; Hong Guo; Fei Liu
Author_Institution :
Department of Physics, McGill University, Montré
Abstract :
Using advanced parameter-free first-principles calculations, we suggested that corundum (a-Al2O3) is a promising candidate of the dielectric materials for monolayer black-phosphorus (BP). Hydrogen passivated Al2O3 is preferred to avoid metallization with monolayer BP. Clean interface is found between monolayer BP and H-terminated Al2O3. The valence-band offset for these systems is around 0.9eV, which is appropriate to create a reasonable carrier injection barrier. Moreover, orientation effect is found to be of great significance for these systems. Special orientation can generate an indirect band gap for monolayer BP.
Keywords :
"Aluminum oxide","Charge transfer","Phosphorus","Atomic layer deposition","Dielectric materials","Chemicals","Transistors"
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
Print_ISBN :
978-1-4673-7858-1
DOI :
10.1109/SISPAD.2015.7292257