• DocumentCode
    3667907
  • Title

    Full-quantum study of AlGaN/GaN HEMTs with InAlN back-barrier

  • Author

    Luca Lucci;Jean-Charles Barbé;Marco Pala

  • Author_Institution
    CEA Leti, MINATEC Campus, 17, rue des Martyrs, F-38054, Grenoble, France
  • fYear
    2015
  • Firstpage
    128
  • Lastpage
    131
  • Abstract
    A full-quantum simulation of the electron transport in the two-dimensional electron gas (2DEG) of a AlGaN/GaN/InAlN/GaN heterostructure is carried out using the non-equilibrium Green function (NEGF) approach. The introduction of the InAlN back-barrier and the use of a ultra-thin GaN layer for the charge transport considerably entangles the physics of the device. A full-quantum approach is then deemed necessary to shed light on the transport properties of these devices. Gate-length and channel-thickness scaling are studied to assess the impact of confinement effects on the elctrostatic integrity of the device.
  • Keywords
    "Gallium nitride","Logic gates","Wide band gap semiconductors","HEMTs","MODFETs","Aluminum gallium nitride","Aluminum nitride"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292275
  • Filename
    7292275