DocumentCode
3667907
Title
Full-quantum study of AlGaN/GaN HEMTs with InAlN back-barrier
Author
Luca Lucci;Jean-Charles Barbé;Marco Pala
Author_Institution
CEA Leti, MINATEC Campus, 17, rue des Martyrs, F-38054, Grenoble, France
fYear
2015
Firstpage
128
Lastpage
131
Abstract
A full-quantum simulation of the electron transport in the two-dimensional electron gas (2DEG) of a AlGaN/GaN/InAlN/GaN heterostructure is carried out using the non-equilibrium Green function (NEGF) approach. The introduction of the InAlN back-barrier and the use of a ultra-thin GaN layer for the charge transport considerably entangles the physics of the device. A full-quantum approach is then deemed necessary to shed light on the transport properties of these devices. Gate-length and channel-thickness scaling are studied to assess the impact of confinement effects on the elctrostatic integrity of the device.
Keywords
"Gallium nitride","Logic gates","Wide band gap semiconductors","HEMTs","MODFETs","Aluminum gallium nitride","Aluminum nitride"
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
ISSN
1946-1569
Print_ISBN
978-1-4673-7858-1
Type
conf
DOI
10.1109/SISPAD.2015.7292275
Filename
7292275
Link To Document