• DocumentCode
    3667969
  • Title

    Critical distance method for predicting the tail part of the threshold voltage distribution

  • Author

    Sungman Rhee;Seongwook Choi;YoungJune Park

  • Author_Institution
    School of Electrical Engineering and Computer Science, Seoul National University, Korea
  • fYear
    2015
  • Firstpage
    381
  • Lastpage
    384
  • Abstract
    As a source of the tail of the statistical distribution of MOSFET threshold voltage distributions, we identified how the potential chain extending from one width edge of the channel to the other width edge creates an abnormally large VT shift, using 3-D TCAD simulations. The critical distance between two adjacent fixed charges in a potential chain that is required to block the channel current has been identified, and its dependence on parameters has been verified. Using the critical distance, the probability of the occurrence of the worst case scenario, in which source to drain current is blocked by the potential chain, for 1 billion transistors has been predicted through percolation method.
  • Keywords
    "Doping","Probability","MOSFET","Electric potential","Logic gates","Threshold voltage"
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2015 International Conference on
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4673-7858-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.2015.7292339
  • Filename
    7292339