Title :
Optical measurements of heat treated silica samples
Author :
F. Mazzocchi;T. Scherer;R. Saavedra;P. Martin Martinez
Author_Institution :
Karlsruhe Institute of Technology, 76344, Eggenstein Leopoldshafen (GER)
Abstract :
In the following article the measurements performed at CIEMAT on several silica samples are described. The samples were treated in both N2 and O2 atmosphere, in a temperature range from 500 to 1000°C. The measurements include UV - VIS - NIR absorption spectroscopy, FT-IR transmission and reflectance spectroscopy, and visual inspection of the treated samples with a confocal microscope.
Keywords :
"Annealing","Silicon compounds","Atmospheric measurements","Reflectivity","Temperature measurement","Atmosphere","Microscopy"
Conference_Titel :
Infrared, Millimeter, and Terahertz waves (IRMMW-THz), 2015 40th International Conference on
Electronic_ISBN :
2162-2035
DOI :
10.1109/IRMMW-THz.2015.7327424
