DocumentCode :
3691595
Title :
Comparison of different models for arsenic activation in HgCdTe
Author :
X. H. Zhou;Y. Huang;X. S. Chen;W. Lu
Author_Institution :
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of, Sciences, Shanghai 200083, China
fYear :
2015
Firstpage :
1
Lastpage :
2
Abstract :
Arsenic doping of HgCdTe has proved problematic. Two-step anneals are usually required to activate the dopant. The model frequently used to explain p-type doping with arsenic requests an amphoteric nature of group V atoms in the II-VI lattice. This requires that group VI substitution with arsenic only occurs under mercury-rich conditions either during growth or the subsequent annealing, and includes site transferring of the As. However, there are inconsistencies in the amphoteric model and unexplained experimental observations. A new model, based on defect-mediated diffusion of the arsenic, is therefore proposed.
Keywords :
"Arsenic","II-VI semiconductor materials","Cadmium compounds","Molecular beam epitaxial growth","Semiconductor process modeling","Annealing"
Publisher :
ieee
Conference_Titel :
Infrared, Millimeter, and Terahertz waves (IRMMW-THz), 2015 40th International Conference on
ISSN :
2162-2027
Electronic_ISBN :
2162-2035
Type :
conf
DOI :
10.1109/IRMMW-THz.2015.7327811
Filename :
7327811
Link To Document :
بازگشت