DocumentCode
3692635
Title
Shear mode properties of c-axis parallel oriented Scx Al1−x N films grown by RF bias sputtering
Author
Shinji Takayanagi;Mami Matsukawa;Takahiko Yanagitani
Author_Institution
Faculty of Science and Engineering, Doshisha University, Kyotanabe, Kyoto, Japan
fYear
2015
Firstpage
1
Lastpage
4
Abstract
Because the increase of piezoelectricity was found in Sc heavily doped AlN films, they have been well studied. Many researchers investigate the properties of the longitudinal mode bulk acoustic wave with c-axis normally oriented ScAlN films. However, there are few reports on the shear mode properties because of difficulties in growth of c-axis parallel oriented ScAlN films which can excite shear mode bulk acoustic wave. In this study, we demonstrated the film growth of c-axis parallel oriented ScAlN using RF substrate bias RF magnetron sputtering method. As a result of X-ray diffraction analyses, we obtained c-axis parallel oriented AlN, Sc0.05Al0.95N and Sc0.13Al0.87N films. Then, High overtone bulk acoustic wave resonators were fabricated with these films. They excited shear mode bulk acoustic wave, but shear mode conversion losses were large (more than 20 dB). It is necessary to obtain highly-crystallized ScAlN films.
Keywords
"Films","Radio frequency","Surface waves","Surface treatment","Nitrogen","X-ray scattering","Cooling"
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2015 IEEE International
Type
conf
DOI
10.1109/ULTSYM.2015.0537
Filename
7329631
Link To Document