Title :
SOI technology for front end applications
Author :
Z. Shaked;P. Hurwitz;A. Heiman;K. Moen;R. Kanawati;S. Chaudhry;M. Racanelli
Author_Institution :
TowerJazz, Migdal HaEmek, Israel
Abstract :
SOI processes have become the mainstream technology for wireless front end manufacturing following recent optimization of starting materials and fabrication processes. In this paper, we will describe such RFSOI platform for RF switches, the process optimizations and the devices offering required for efficient FEM design.
Keywords :
"CMOS integrated circuits","Fabrication","Switches","Wireless communication","Indexes","Silicon","Distortion measurement"
Conference_Titel :
Microwaves, Communications, Antennas and Electronic Systems (COMCAS), 2015 IEEE International Conference on
DOI :
10.1109/COMCAS.2015.7360403
