• DocumentCode
    3726017
  • Title

    Actinic EUV mask inspection using coherent EUV source based on high-order harmonic generation

  • Author

    Yong Soo Kim;June Park;Han Yong Park;Hamin Sung;Jomsool Kim;Seung Beom Lee;Hyun Woo Cho;Ju Han Lee;Min-Chul Park;Young Min Jhon

  • Author_Institution
    Korea Institute of Science of Technology, 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul
  • Volume
    2
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We developed a coherent scattering microscope (CSM) for actinic EUV mask inspection. The CSM system was designed to measure critical dimensions down to 88 nm, and 200 nm l/s patterns were experimentally inspected.
  • Keywords
    "Ultraviolet sources","Inspection","Lithography","Frequency conversion","Diffraction","Laser beams","Laser excitation"
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015 11th Conference on
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2015.7376009
  • Filename
    7376009
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3726017