DocumentCode :
3748122
Title :
Non volatile memory evolution and revolution
Author :
Paolo Cappelletti
Author_Institution :
Micron Technology - Via C. Olivetti 2, 20864 Agrate Brianza, Italy
fYear :
2015
Abstract :
For over 40 years, the evolution of Non Volatile Memories has been mostly based on the floating gate MOS transistor. We have successfully succeeded in scaling this wonderful device below 20nm but we are now approaching the limit. It is time for disruptive innovations, either integrating the same basic device in a vertical structure or moving to totally different device concepts. This paper analyzes the different alternatives in relation to their areas of application.
Keywords :
"Three-dimensional displays","Nonvolatile memory","Random access memory","Flash memories","Phase change materials","MOSFET","Technological innovation"
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
Type :
conf
DOI :
10.1109/IEDM.2015.7409666
Filename :
7409666
Link To Document :
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