Title :
Non volatile memory evolution and revolution
Author :
Paolo Cappelletti
Author_Institution :
Micron Technology - Via C. Olivetti 2, 20864 Agrate Brianza, Italy
Abstract :
For over 40 years, the evolution of Non Volatile Memories has been mostly based on the floating gate MOS transistor. We have successfully succeeded in scaling this wonderful device below 20nm but we are now approaching the limit. It is time for disruptive innovations, either integrating the same basic device in a vertical structure or moving to totally different device concepts. This paper analyzes the different alternatives in relation to their areas of application.
Keywords :
"Three-dimensional displays","Nonvolatile memory","Random access memory","Flash memories","Phase change materials","MOSFET","Technological innovation"
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
DOI :
10.1109/IEDM.2015.7409666