Title :
A 193 nm light source using fiber amplifier and nonlinear wavelength conversion
Author :
Owa, S. ; Doi, M. ; Kawai, H. ; Kitano, H. ; Miwa, S. ; Matsuura, H. ; Tokuhisa, A.
Author_Institution :
Core Technol. Center, Nikon Corp., Tokyo, Japan
Abstract :
One approach to compact UV light sources is an all-solid-state 193 nm laser system, which utilizes an Er-doped fiber amplifier (EDFA) of 1547 nm wavelength as part of the fundamental light source, and five-stage frequency conversion optics for generating the eighth harmonic of 193 nm light. We propose the use of GdxY1-x Ca4O(BO3)3 as the fourth-harmonic crystal to improve the wavelength conversion optics, and report the results of durability tests up to 500 hours
Keywords :
erbium; light sources; optical fibre amplifiers; optical harmonic generation; optical wavelength conversion; 1547 nm; 193 nm; 193 nm light source; 500 hour; EDFA; Er-doped fiber amplifier; GdxY1-xCa4O(BO3) 3; all-solid-state 193 nm laser system; compact UV light sources; durability tests; eighth harmonic; five-stage frequency conversion optics; fourth-harmonic crystal; nonlinear wavelength conversion; wavelength conversion optics; Erbium-doped fiber amplifier; Fiber lasers; Fiber nonlinear optics; Frequency conversion; Light sources; Nonlinear optics; Optical fiber amplifiers; Optical harmonic generation; Optical wavelength conversion; Stimulated emission;
Conference_Titel :
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-7105-4
DOI :
10.1109/LEOS.2001.969170
