Title :
Design of circular waveguide transition with circular profile in electron cyclotron resonance plasma etching system
Author :
Jan-Dong Tseng ; Chi-Chan Lin
Author_Institution :
Dept. of Electron. Eng., Nat. Chin Yi Inst. of Technol., Taichung, Taiwan
Abstract :
A circular waveguide transition for 2.45 GHz ECR (electron cyclotron resonance) plasma etching system is designed. This circular waveguide transition is constructed in its longitudinal profile by two circular curves. In addition, two circular curves tangent values are continuous at the connected point. The magnitude of the electric field at the output of the waveguide transition for three different curvature values are investigated. The best field uniformity of electric field in the case we discussed is found.
Keywords :
circular waveguides; electric fields; sputter etching; waveguide transitions; 2.45 GHz; 37.5 mm; ECR plasma etching system; circular waveguide transition; curvature values; electric field; electron cyclotron resonance; field uniformity; longitudinal profile; Cyclotrons; Electrons; Etching; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma waves; Resonance; Waveguide transitions;
Conference_Titel :
Microwave Conference, 2001. APMC 2001. 2001 Asia-Pacific
Conference_Location :
Taipei, Taiwan
Print_ISBN :
0-7803-7138-0
DOI :
10.1109/APMC.2001.985433
