• DocumentCode
    37771
  • Title

    Response to comments to "A distributive-transconductance model for border traps in III-V/High-k MOS capacitors"

  • Author

    Chen Zhang ; Min Xu ; Ye, Peide D. ; Xiuling Li

  • Author_Institution
    Electr. & Comput. Eng. Dept., Univ. of Illinois, Urbana, IL, USA
  • Volume
    34
  • Issue
    11
  • fYear
    2013
  • fDate
    Nov. 2013
  • Firstpage
    1441
  • Lastpage
    1441
  • Abstract
    Summary form only given. We would like to thank Professor Taur and his colleagues for pointing out that the variation of an additional factor, emission probability (en), affects the charging current associated with border traps. While the new derivation shown in their comments is complete, we believe that the transconductance model of the above-named article [ibid., vol. 34, no. 6, pp. 735-737, Jun. 2013] does not introduce significant numerical error when applied to interpret the C-V data (1 kHz-1 MHz) measured from the high-k/GaAs MOS systems discussed in the original article. The original authors present a model to show that in spite of the missing factor in transconductance model, the model does not introduce significant errors within the parameter range discussed in the original work so the conclusions about the GaAs MOS capacitors in the original article should still be considered valid.
  • Keywords
    III-V semiconductors; MOS capacitors; gallium arsenide; semiconductor device models; C-V data; GaAs; III-V/high-k MOS capacitors; border traps; charging current; distributive-transconductance model; emission probability; frequency 1 kHz to 1 MHz; high-k/GaAs MOS systems; Capacitance; Electron traps; High K dielectric materials; MOS capacitors; Numerical models; Semiconductor device modeling; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2013.2282234
  • Filename
    6619443