Title :
Double diffraction alignment method using checker grating
Author :
M. Tabata;T. Tojo
Author_Institution :
VLSI Research Center, Toshiba Corporation, 1, Komukai-Toshiba-cho, Saiwai-ku, Kawasaki, 210, Japan
fDate :
5/1/1987 12:00:00 AM
Abstract :
An interferometric alignment method, using checker grating construction, has been newly demonstrated for submicron lithography. This alignment method has satisfied resist process and lithography system requirements and has the following characteristics.
Keywords :
"Gratings","Resists","Optical interferometry","Lenses","Interferometric lithography","Laser beams"
Conference_Titel :
VLSI Technology, 1987. SymVLSITech 1987. Symposium on
Print_ISBN :
978-1-5090-3151-1
