Title :
Variation of reflectivity spectra, preferred orientation and stoichiometry of polycrystalline TiN films due to nitrogen flow variation
Author :
M. Zlatanovic;D. Dukic;U. Kascak;I. Popovic
Author_Institution :
Sch. of Electr. Eng., Belgrade Univ., Serbia
Abstract :
TiN samples were deposited in a DC reactive magnetron deposition system with varying deposition parameters. It was found that slight variations of the nitrogen content during deposition affected preferred growth and composition which strongly influenced optical reflectivity of the investigated samples.
Keywords :
"Reflectivity","Tin","Optical films","Nitrogen","Coatings","X-ray scattering","Data analysis","Microelectronics","Adhesives","Electric resistance"
Conference_Titel :
Microelectronics, 2000. Proceedings. 2000 22nd International Conference on
Print_ISBN :
0-7803-5235-1
DOI :
10.1109/ICMEL.2000.840569
