DocumentCode :
3783737
Title :
Post-growth thermal treatment of the InAs/GaAs quantum dots
Author :
J. Jasinski;A. Babinski;R. Bozck;J.M. Baranowski
Author_Institution :
Inst. of Experimental Phys., Warsaw Univ., Poland
fYear :
2000
Firstpage :
272
Lastpage :
275
Abstract :
The effect of post-growth thermal treatment on the InAs/GaAs quantum dots is investigated. The photoluminescence (PL) and transmission electron microscopy (TEM) studies of samples annealed at temperatures up to 950/spl deg/C are presented. A complete dissolution of QDs and substantial broadening of the wetting layer (WL) can be seen by TEM. Therefore the thermally induced modification of the WL (rather than QDs) is responsible for a blue-shift and narrowing of PL peaks in our structure containing InAs/GaAs QDs.
Keywords :
"Gallium arsenide","Quantum dots","US Department of Transportation","Photoluminescence","Temperature","Epitaxial growth","Rapid thermal annealing","Molecular beam epitaxial growth","Transmission electron microscopy","Epitaxial layers"
Publisher :
ieee
Conference_Titel :
Semiconducting and Insulating Materials Conference, 2000. SIMC-XI. International
Print_ISBN :
0-7803-5814-7
Type :
conf
DOI :
10.1109/SIM.2000.939242
Filename :
939242
Link To Document :
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