Title :
Correlation between the spin disorder resistivity and crystal structure of thulium thin films
Author :
J. Dudas;A. Feher;V. Kavecansky;I. Goscianska;H. Ratajczak
Author_Institution :
Dept. of Electr. Eng. Theory, Tech. Univ., Kosice, Poland
Abstract :
An increase of the spin-disorder resistivity with decreasing film thickness has been observed in thulium thin films prepared in UHV. X-ray diffraction investigation in thinner films with thickness below /spl ap/100 nm revealed that this dependence is caused by a structural change.
Keywords :
"Conductivity","Transistors","Magnetic films","Electric resistance","Physics","Electrical resistance measurement","Pollution measurement","Optical films","X-ray diffraction","Temperature"
Journal_Title :
IEEE Transactions on Magnetics
