DocumentCode :
3850835
Title :
Etching of Bacterial Capsule and Cell Wall by Oxygen Plasma Afterglow
Author :
Kristina Elersic;Ita Junkar;Ales Spes;Daniela Vujosevic;Zoran Vratnica;Uroš Cvelbar
Author_Institution :
Jozef Stefan Institute, Ljubljana, Slovenia
Volume :
39
Issue :
11
fYear :
2011
Firstpage :
2972
Lastpage :
2973
Abstract :
Sterilization of delicate materials by gaseous plasma represents an interesting task for plasma scientists. While sporulating bacteria are rather resistant to weak plasma treatments, some bacteria are destroyed even in an afterglow. A representative type of nonsporulating bacteria is Staphylococcus aureus. Such bacteria are destroyed by treatment with mostly neutral O atoms found in oxygen plasma afterglow. The degradation steps are followed by atomic force microscopy. The bacteria remain vital for about 2 min of treatment at the O flux of about 1.3 ×1022 m-2·s-1. The bacterial capsule is removed in about 2 min. Once the capsule is removed, degradation of the cell wall occurs, causing bacterial death.
Keywords :
"Plasmas","Microorganisms","Degradation","Substrates","Discharges","Atomic layer deposition"
Journal_Title :
IEEE Transactions on Plasma Science
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2011.2159024
Filename :
5957314
Link To Document :
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