• DocumentCode
    387012
  • Title

    A GaAs Monolithic Phase Shifter for 30 GHz Application

  • Author

    Sokolov, V. ; Bauhahn, P. ; Geddes, J. ; Contolatis, T. ; Chao, C.

  • Volume
    83
  • Issue
    1
  • fYear
    1983
  • fDate
    31 May-1 Jun 1983
  • Firstpage
    40
  • Lastpage
    44
  • Abstract
    The design and performance of a GaAs monolithic 180 degrees one-bit phase shifter test circuit for Ka-band operation is presented. Over the 27.5 to 30 GHz band the measured differential phase shift is within 10 degrees of the ideal characteristic and the insertion loss is between 4 and 6 dB. The switching FETs are fabricated by ion implantation into LEC material using a power FET implant schedule. I-V characteristics are also presented for a self-aligned gate FET whose channel resistance is reduced by more than a factor of two relative to the power FET. This latter fabrication technique holds promise in reducing phase shifter insertion loss for mm-wave applications.
  • Keywords
    Circuit testing; FETs; Fabrication; Gallium arsenide; Implants; Insertion loss; Ion implantation; Loss measurement; Phase measurement; Phase shifters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter-Wave Monolithic Circuits
  • Type

    conf

  • DOI
    10.1109/MCS.1983.1151039
  • Filename
    1151039