DocumentCode
389169
Title
Local degradation of conductive microstructures of integrated chips at the effect of powerful pulsing electromagnetic fields
Author
Starostenko, V.V. ; Taran, Ye.P. ; Tereshenko, V.Yu.
Author_Institution
Tavrical Nat. Univ., Simferopol, Ukraine
fYear
2001
fDate
14-14 Sept. 2001
Firstpage
544
Lastpage
545
Abstract
The processes of local degradation of conductive microstructures of integrated chips are surveyed for the effect of powerful electromagnetic fields. The time of development of nonreversible degradation processes is identified and the geometrical size of local sites of metal film burn-up is detected.
Keywords
electromagnetic pulse; integrated circuit metallisation; integrated circuit modelling; integrated circuit reliability; thermal analysis; IC local degradation; conductive microstructures; dynamic electrothermal model; integrated chips; metal film burn-up; metallic films; nonuniform metal-dielectric microstructures; powerful electromagnetic fields; powerful pulsed EM fields; reliable operation;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Telecommunication Technology, 2001. CriMiCo 2001. 11th International Conference on
Conference_Location
Sevastopol, Crimea, Ukraine
Print_ISBN
966-7968-00-6
Type
conf
Filename
1173963
Link To Document