• DocumentCode
    391999
  • Title

    Thin film resistor and conductor on Duroid® soft material

  • Author

    Yueli, Qin ; Nengwu, Gao ; Fei, Xie

  • Author_Institution
    Southwest Res. Inst. of Electron. Equip., China
  • fYear
    2002
  • fDate
    17-19 Aug. 2002
  • Firstpage
    158
  • Lastpage
    162
  • Abstract
    The appearance of the RT/Duroid® without copper is not suitable for manufacturing thin film resistor and conductor due to the tissue of the material. Changing the appearance is necessary for thin film purposes. The thin film resistor and conductor are realized on the changed Duroid material by sputtering, photolithography and etching technologies. The properties of the integrated resistors are discussed in detail in this paper. The method is useful to miniaturize and integrate the microwave products.
  • Keywords
    etching; microwave integrated circuits; photolithography; sputter deposition; thin film resistors; Duroid soft material; etching; microwave integrated circuits; microwave products; photolithography; sputtering; thin film conductor; thin film resistor; Biological materials; Conducting materials; Conductive films; Copper; Lithography; Manufacturing; Resistors; Sputter etching; Sputtering; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter Wave Technology, 2002. Proceedings. ICMMT 2002. 2002 3rd International Conference on
  • Print_ISBN
    0-7803-7486-X
  • Type

    conf

  • DOI
    10.1109/ICMMT.2002.1187659
  • Filename
    1187659
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=391999