Multicrystalline LLC-silicon thin film cells on glass

In a one chamber process multicrystalline silicon thin film solar cells with crystallites in the range of 10 to more than 100 μm were deposited on uncoated glass by layered laser crystallization (LLC). During PECVD deposition of a-Si:H, laser crystallization was performed in the deposition chamber. A 400 nm thick seed layer simultaneously acting as transparent electrode was crystallized by scanning an Ar⁺-laser beam. Epitaxial thickening by applying repeated pulses of an KrF excimer laser was performed during further a-Si:H deposition. p⁺-p-n⁺ cells with 3 μm thick absorber without reflector and without antireflection coating showed V_oc = 425 mV, I_sc = 9.8 mA/cm², FF = 55%, and n = 2.3%.