DocumentCode :
39523
Title :
Impacts of Tapered Sidewall Profiles With High Aspect Ratio on Subwavelength Grating Structure
Author :
Yu, Wenxi X. ; Yi, Y.
Author_Institution :
Dearborn Campus, Univ. of Michigan, Dearborn, MI, USA
Volume :
27
Issue :
13
fYear :
2015
fDate :
July1, 1 2015
Firstpage :
1437
Lastpage :
1440
Abstract :
We have numerically demonstrated the significant impacts on the resonance mode characteristics of subwavelength grating structures due to tapered sidewall profile and high aspect ratio, which is normally obtained due to the practical CMOS-compatible fabrication and etching processes. Our simulation results have revealed that the tapered sidewall profile with high aspect ratio plays important roles on the resonance mode behavior of subwavelength grating photonic devices. The coupling mechanism between the guided mode resonance and the grating cavity is also emphasized. Our numerical studies can be utilized for a series of integrated photonic devices applications, such as compact optical filter, photonic amplifier, and lasers, while considering realistic subwavelength grating structures due to current nanoelectronics fabrication process.
Keywords :
diffraction gratings; etching; integrated optoelectronics; optical fabrication; optical waveguide theory; CMOS-compatible fabrication; aspect ratio; coupling mechanism; etching; grating cavity; guided mode resonance; integrated photonic devices; resonance mode characteristics; subwavelength grating photonic devices; subwavelength grating structure; tapered sidewall profiles; Cavity resonators; Couplings; Etching; Fabrication; Gratings; Optical filters; Photonics; Diffraction gratings; light enhancement; resonators; sub wavelength structures;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2015.2424596
Filename :
7093148
Link To Document :
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