DocumentCode
39550
Title
Variability Mitigation Mechanisms in Scaled 3T1D-DRAM Memories to 22 nm and Beyond
Author
Amat, Esteve ; Almudever, C.G. ; Aymerich, N. ; Canal, Ramon ; Rubio, Albert
Author_Institution
Univ. Politec. de Catalunya, Barcelona, Spain
Volume
13
Issue
1
fYear
2013
fDate
Mar-13
Firstpage
103
Lastpage
109
Abstract
It has been stated that 3T1D-DRAM cell is a valid alternative to be implemented on L1 memory cache to substitute 6T, highly affected by variability. In this paper, it is shown that the 3T1D memory cells present significant tolerance to high levels of device parameter fluctuation when they are scaled to nodes smaller than 22 nm. Furthermore, we present some strategies to mitigate the cell variability. Moreover, while scaling down capacitorless DRAM cells is a challenging trend, we also show how the scaling drawbacks can be compensated through the following: 1) the channel strain of the cell devices and 2) the proposal of new strategies to further enhance the memory cell behavior.
Keywords
DRAM chips; L1 memory cache; cell device channel strain; device parameter fluctuation; scaled 3T1D-DRAM memory; scaling down capacitorless DRAM cell; size 22 nm; variability mitigation mechanism; Computer architecture; Fluctuations; Logic gates; Microprocessors; Performance evaluation; Random access memory; Strain; DRAM; temperature; variability;
fLanguage
English
Journal_Title
Device and Materials Reliability, IEEE Transactions on
Publisher
ieee
ISSN
1530-4388
Type
jour
DOI
10.1109/TDMR.2012.2217497
Filename
6296696
Link To Document