Low-losses coupled-lines silicon micromachined band-pass filters for the 45 GHz frequency band

Author

Neculoiu, D. ; Bartolucci, G. ; Pons, P. ; Bary, L. ; Vasilache, D. ; Buiculescu, C. ; Vladoianu, F. ; Dragoman, M. ; Petrini, I. ; Muller, A. ; Plana, R.

Author_Institution

IMT Bucharest, Romania

Volume

1

fYear

2003

fDate

28 Sept.-2 Oct. 2003

Abstract

This paper presents the design, fabrication and testing of a micromachined coupled-lines band-pass filter for the 45 GHz frequency band. The design technique is based on identical symmetrical cells connected in cascade and image parameters representation of two-ports. The filter structures are fabricated using silicon reactive ion etching. The experimental characterization demonstrates transmission losses lower than 1 dB.

Keywords

band-pass filters; elemental semiconductors; micromechanical devices; millimetre wave filters; silicon; sputter etching; 1 dB; 45 GHz; 45 GHz frequency band; Si; cascade; design; fabrication; identical symmetrical cells; image parameters; low-losses coupled-lines Si micromachined band-pass filters; reactive ion etching; testing; transmission losses; two-ports representation; Band pass filters; Biomembranes; Couplings; Fabrication; Frequency; Impedance; Micromachining; Millimeter wave technology; Silicon; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2003. CAS 2003. International

Print_ISBN

0-7803-7821-0

Type

conf

DOI

10.1109/SMICND.2003.1251356

Filename

1251356