Title :
Droplet laser plasma sources of EUV radiation
Author :
Richardson, Martin
Author_Institution :
Sch. of Opt., Central Florida Univ., Orlando, FL, USA
Abstract :
This paper reports on the latest developments of EUV point sources of sufficient power and longevity for EUV lithography applications. Moreover, this paper gives an overall perspective of the developments required for laser plasmas to meet the requirements of the ITRS roadmap for EUV.
Keywords :
drops; plasma diagnostics; plasma production by laser; plasma sources; ultraviolet lithography; ultraviolet sources; EUV lithography; EUV radiation sources; droplet laser plasma sources; laser plasmas; Laser modes; Laser stability; Lithography; Mirrors; Plasma sources; Power lasers; Scanning electron microscopy; Spectroscopy; Tin; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7888-1
DOI :
10.1109/LEOS.2003.1251715
