Title :
Hot carrier emission from 50 nm n- and p-channel MOSFET devices
Author :
Rowlette, Jeremy A. ; Varner, Elizabeth B. ; Seidel, Steve ; Bailon, Michelle
Abstract :
In this analysis, we present emission spectra from both n- and p-channel transistors fabricated on 90 nm technology featuring 50 nm channel lengths .Time resolved emission (TRE) is an important through-silicon integrated circuit timing analysis technique, which enables noninvasive characterization of internal dynamic circuits by means of the collection and the time "stamping" of near-IR photons naturally emitted from biased transistors. Spectral analysis of hot carrier emissions in MOSFET devices is of interest for several reasons: (1) It may help to improve the bandwidth of existing TRE technologies artificially by allowing the distinction between n- and p-channel device emissions; (2) It may lead to improved TRE system response optimization; (3) It may provide new or enhanced understanding of internal device physics; and (4) It may offer deeper insight into the scalability of existing TRE technologies.
Keywords :
MOSFET; elemental semiconductors; hot carriers; hot electron transistors; integrated circuits; luminescence; silicon; spectral analysis; time resolved spectra; MOSFET devices; Si; emission spectra; hot carrier emission; internal dynamic circuits; n-channel transistor fabrication; near-IR photons; p-channel transistors fabrication; spectral analysis; system response optimization; through-silicon integrated circuit timing analysis technique; time resolved emission; time stamping; Bandwidth; Circuit analysis; Hot carriers; Integrated circuit technology; MOSFET circuits; Photonic integrated circuits; Physics; Scalability; Spectral analysis; Timing;
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7888-1
DOI :
10.1109/LEOS.2003.1253013