DocumentCode :
400379
Title :
Plasmon enhancement of optical near-field of metal nanoaperture VCSEL
Author :
Hashizume, J. ; Koyama, Fumio
Author_Institution :
Microsyst. Res. Center, Tokyo Inst. of Technol., Yokohama, Japan
Volume :
2
fYear :
2003
fDate :
27-28 Oct. 2003
Firstpage :
804
Abstract :
In this paper, we propose a novel structure to enhance the optical near-field in metal nano-aperture VCSELs based on the excitation of localized plasmon around a metal nano-aperture. The far-field radiation power from the aperature is increased by a factor of 4 by inserting a SiO2 layer.
Keywords :
electromagnetic fields; nanotechnology; silicon compounds; surface emitting lasers; surface plasmons; SiO2; SiO2 layer; far-field radiation power; localized plasmon excitation; metal nanoaperture VCSEL; optical near-field; plasmon enhancement; Apertures; Gold; High speed optical techniques; Memory; Optical diffraction; Optical recording; Plasmons; Power generation; Power measurement; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
ISSN :
1092-8081
Print_ISBN :
0-7803-7888-1
Type :
conf
DOI :
10.1109/LEOS.2003.1253044
Filename :
1253044
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=400379
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