DocumentCode
400387
Title
Germanium on double-SOI photodetectors for 1550 nm operation
Author
Dosunmu, Olufemi ; Emsley, Matthew K. ; Cannon, Douglas D. ; Ghyselen, Bruno ; Kimerling, Lionel C. ; Ünlü, M. Selim
Author_Institution
Dept. of Electr. & Comput. Eng., Boston Univ., MA, USA
Volume
2
fYear
2003
fDate
27-28 Oct. 2003
Firstpage
853
Abstract
In this paper, we have fabricated a resonant cavity enhanced (RCE) Ge-on-double-silicon on insulator (SOI) photodetector for operation around the 1550 nm communication wavelength. The enhanced response of this detector is attributed to both the resonant cavity effect as well as the strain induced band gap narrowing of the Ge layer.
Keywords
cavity resonators; elemental semiconductors; energy gap; germanium; optical communication equipment; optical fabrication; photodetectors; silicon compounds; silicon-on-insulator; 1550 nm; SOI; Si; SiO2-Si-Ge; communication wavelength; double-silicon-on-insulator photodetector fabrication; germanium layer; resonant cavity; strain induced band gap narrowing; Absorption; Detectors; Distributed Bragg reflectors; Germanium; Lattices; Materials science and technology; Mirrors; Photodetectors; Photonic band gap; Resonance;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
ISSN
1092-8081
Print_ISBN
0-7803-7888-1
Type
conf
DOI
10.1109/LEOS.2003.1253069
Filename
1253069
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