Title :
Particle reduction strategies for high current-high volume manufacturing
Author :
Hatch, P. ; Santiesteban, Raul ; Taduri, S. ; Krantz, B. ; Melosky, S. ; Marshall, D.A. ; Ameen, M.S.
Abstract :
The particle performance of high current implanters was studied in a wide variety of production environments and applications over a period exceeding two years. Equipment design, preventive maintenance and tool utilization were all found to play a critical role achieving particle levels < 0.10 particles/cm2 on a routine basis. Based on a parametric study of root causes, including detailed analysis of trend data and particle maps, beamline and endstation hardware was developed to address specific issues and optimize machine performance. A systematic method using six-sigma procedures, designed experiments, and SPC tools, is described for implementing procedural, software and hardware changes in a production environment. This methodology allowed us to demonstrate improvements in both equipment productivity and particle performance.
Keywords :
focused ion beam technology; ion implantation; ion sources; semiconductor doping; beamline hardware; endstation hardware; equipment design; high current-high volume manufacturing; particle maps; particle reduction strategies; preventive maintenance; six-sigma procedures; tool utilization; Data analysis; Hardware; Manufacturing; Parametric study; Particle production; Performance analysis; Preventive maintenance; Production systems; Productivity; Software tools;
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location :
Taos, New Mexico, USA
Print_ISBN :
0-7803-7155-0
DOI :
10.1109/IIT.2002.1258003