DocumentCode
400951
Title
Gas cluster ion beam processing equipment
Author
Bachand, J. ; Freytsis, A. ; Harrington, E. ; Gwinn, M. ; Hofmeester, N. ; Hautala, J. ; Regan, K.
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
669
Lastpage
672
Abstract
Gas cluster ion beams (GCIB) are finding many applications for surface smoothing and etching of a variety of materials including semiconductors. Epion has developed commercial processing equipment, which makes possible practical application of GCIB beams for production processes. This equipment includes automatic recipe setup and tracking. Process uniformity and repeatability has been demonstrated to be better than 1%. Charge control keeps substrate charging to less than ±6 V. Throughputs as high as 10 W/hr are achievable with 200 mm wafers.
Keywords
beam handling equipment; focused ion beam technology; ion beam assisted deposition; ion beams; ionised cluster beam deposition; sputter etching; surface cleaning; 200 mm; 6 V; charge control; etching; gas cluster ion beam processing equipment; process uniformity; repeatability; surface smoothing; Atomic measurements; Electrons; Etching; Gases; III-V semiconductor materials; Ion beams; Nitrogen; Smoothing methods; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258094
Filename
1258094
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