Fabrication sub-micron gratings based on embossing

Author

Li, YiGui ; Hui, Chun ; Zhu, Jun ; Liu, Jingquan ; Kanamori, Yoshiaki

Author_Institution

Key Lab. for Thin Film & Microfabrication of Minist. of Educ., Shanghai Jiaotong Univ., China

fYear

2003

fDate

5-7 May 2003

Firstpage

350

Lastpage

352

Abstract

We demonstrated two kinds of sub-micron gratings fabricated by embossing method from anisotropically etched silicon molds. One kind of grating is a line grating with a pitch of 500 nm; the other kind is grating array with a pitch of 200 nm. We investigated the feasibility of the fabrication method for the micro fabrication of the high aspect ratio silicon molds: that is for fabricating molds by using electron beam lithography plus fast atom beam (FAB) etching. The replication yield, repeatability and efficiency from the original master are good. This technique can also be used to fabricate other sub-micron scale structures.

Keywords

diffraction gratings; electron beam lithography; embossing; etching; micro-optics; micromechanical devices; optical fabrication; silicon; 200 nm; 500 nm; Si; anisotropically etched silicon molds; electron beam lithography; embossing; fast atom beam etching; grating array; high aspect ratio silicon molds; micro fabrication; submicron gratings; Atomic beams; Cathodes; Electron beams; Embossing; Etching; Fabrication; Gratings; Microstructure; Resists; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Design, Test, Integration and Packaging of MEMS/MOEMS 2003. Symposium on

Print_ISBN

0-7803-7066-X

Type

conf

DOI

10.1109/DTIP.2003.1287066

Filename

1287066