DocumentCode
412130
Title
Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures
Author
Taylor, R.S. ; Hnatovsky, C. ; Simova, E. ; Rayner, D.M. ; Bhardwaj, V.R. ; Corkum, P.B.
Author_Institution
Inst. for Microstructural Sci., Nat. Res. Council of Canada, Ottawa, Ont., Canada
fYear
2003
fDate
6-6 June 2003
Abstract
Ultra-high spatial resolution index of refraction profiles of femtosecond laser modified structures in silica glass have been measured using the combination of chemical etching and atomic force microscopy.
Keywords
amorphous semiconductors; atomic force microscopy; etching; high-speed optical techniques; light refraction; optical glass; silicon compounds; SiO/sub 2/; atomic force microscopy; chemical etching; femtosecond laser; modified silica structure; refraction profile; silica glass; ultra-high spatial resolution index; Atom lasers; Atomic force microscopy; Atomic measurements; Chemical lasers; Etching; Force measurement; Glass; Optical refraction; Silicon compounds; Spatial resolution;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-748-2
Type
conf
Filename
1298279
Link To Document