• DocumentCode
    41231
  • Title

    Low-Voltage Steep Turn-On pMOSFET Using Ferroelectric High- \\kappa Gate Dielectric

  • Author

    Chun Hu Cheng ; Chin, Alvin

  • Author_Institution
    Dept. of Mechatron. Technol., Nat. Taiwan Normal Univ., Taipei, Taiwan
  • Volume
    35
  • Issue
    2
  • fYear
    2014
  • fDate
    Feb. 2014
  • Firstpage
    274
  • Lastpage
    276
  • Abstract
    Power consumption is the most difficult challenge for CMOS integrated circuits. Here, we demonstrate experimentally a novel steep turn-on pMOSFET for low-voltage operation for the first time, which exhibits 5-60 mV/decade SS, wide voltage range for , sturdy SS at 85°C, faster transistor turn-on at above threshold voltage, and lower off-state leakage by greater than three orders of magnitude. Such improved leakage current is crucial to decrease the OFF-state leakage current in sub-1X nm CMOS. This was achieved using ferroelectric high-κ ZrHfO gate dielectric pMOSFET.
  • Keywords
    MOSFET; ferroelectric materials; high-k dielectric thin films; low-power electronics; zirconium compounds; ZrHfO; fast transistor turn-on; ferroelectric high-K gate dielectric; low voltage operation; low voltage pMOSFET; off-state leakage; steep turn-on pMOSFET; temperature 85 C; threshold voltage; Dielectric measurement; Dielectrics; Leakage currents; Logic gates; MOSFET; MOSFET circuits; Ferroelectric; ZrHfO; sub-threshold swing; transistor;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2013.2291560
  • Filename
    6693802