• DocumentCode
    41384
  • Title

    On the Origin of Steep I V Nonlinearity in Mixed-Ionic-Electronic-Conduction-Based Access Devices

  • Author

    Padilla, Alvaro ; Burr, Geoffrey W. ; Shenoy, Rohit S. ; Raman, Karthik V. ; Bethune, Donald S. ; Shelby, Robert M. ; Rettner, Charles T. ; Mohammad, Juned ; Virwani, Kumar ; Narayanan, Pritish ; Deb, Arpan K. ; Pandey, Rajan K. ; Bajaj, Mohit ; Murali, K

  • Author_Institution
    SanDisk, Milpitas, CA, USA
  • Volume
    62
  • Issue
    3
  • fYear
    2015
  • fDate
    Mar-15
  • Firstpage
    963
  • Lastpage
    971
  • Abstract
    Numerical modeling is used to explain the origin of the large ON/OFF ratios, ultralow leakage, and high ON-current densities exhibited by back-end-of-the-line-friendly access devices based on copper-containing mixed-ionic-electronic-conduction (MIEC) materials. Hall effect measurements confirm that the electronic current is hole dominated; a commercial semiconductor modeling tool is adapted to model MIEC. Motion of large populations of copper ions and vacancies leads to exponential increases in hole current, with a turn-ON voltage that depends on material bandgap. Device simulations match experimental observations as a function of temperature, electrode aspect ratio, thickness, and device diameter.
  • Keywords
    Hall effect; copper; electrodes; integrated memory circuits; ionic conductivity; mixed conductivity; semiconductor device models; vacancies (crystal); Hall effect; commercial semiconductor modeling tool; copper ions; device simulations; electronic current; high on-current densities; hole current; material bandgap; mixed-ionic-electronic-conduction-based access devices; numerical modeling; on/off ratios; steep I-V nonlinearity; ultralow leakage; vacancies; Copper; Current measurement; Electrodes; Ions; Materials; Mobile communication; Voltage measurement; Semiconductor device modeling; semiconductor-metal interfaces; semiconductor-metal interfaces.;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2015.2389832
  • Filename
    7027176