DocumentCode
414478
Title
Multi-parameter model based advanced process control
Author
Velichko, Sergey A.
Author_Institution
NDM Technol., Boise, ID, USA
fYear
2004
fDate
4-6 May 2004
Firstpage
443
Lastpage
447
Abstract
Advanced Process Control (APC) plays an important role in the modern semiconductor fab. Using non-linear multiple input multiple output (MIMO) control models we significantly improve positive process outcomes. However, non-linear models also impose greater computing requirements, creating computing bottleneck on the fab-wide scale, especially for the wafer-to-wafer control. Low latency computing grids and advanced control optimization techniques solve for the computational problems.
Keywords
MIMO systems; chemical vapour deposition; integrated circuit manufacture; nonlinear control systems; optimisation; process control; semiconductor technology; advanced process control; chemical vapour deposition; computational problems; computing grids; control optimization; multiparameter model; nonlinear multiple input multiple output control; semiconductor fab; wafer-to-wafer control; Furnaces; Inductors; MIMO; Manufacturing processes; Process control; Qualifications; Semiconductor device modeling; Semiconductor devices; Semiconductor films; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop
Print_ISBN
0-7803-8312-5
Type
conf
DOI
10.1109/ASMC.2004.1309612
Filename
1309612
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