DocumentCode
415404
Title
Laser micromachining: fabrication of optical elements in quartz
Author
Kopitkovas, G. ; Lippert, T. ; David, C. ; Wokaun, A. ; Gobrecht, J.
Author_Institution
Paul Scherrer Inst., Villigen, Switzerland
fYear
2003
fDate
22-27 June 2003
Firstpage
556
Abstract
In tihs paper, we present a method for an one step fabrication process of micro-optical elements in quartz by combining laser induced backside wet etching (LIBWE) and a simple projection method. Micro-optical elements in quartz with continuous structure profiles (e.g. beam homogenizers for high power lasers) are usually fabricated by photolithography, and subsequent transfer of the resist profile into quartz by reactive ion etching.
Keywords
laser beam machining; micro-optics; micromachining; photolithography; quartz; sputter etching; continuous structure profile; laser micromachining; micro-optical element; optical element; optical fabrication process; photolithography; quartz; reactive ion etching; Cleaning; Laser ablation; Laser modes; Lenses; Lithography; Micromachining; Optical device fabrication; Resists; Temperature; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2003. CLEO/Europe. 2003 Conference on
Print_ISBN
0-7803-7734-6
Type
conf
DOI
10.1109/CLEOE.2003.1313618
Filename
1313618
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