Alignment issues in photonic crystal device fabrication

Author

De Ridder, René M. ; Bostan, Cazimir G. ; Van Soest, Frank J. ; Gadgil, Vishwas J.

Author_Institution

MESA Res. Inst., Twente Univ., Enschede, Netherlands

Volume

1

fYear

2004

fDate

4-8 July 2004

Firstpage

260

Abstract

An important requirement in the fabrication of photonic crystal structures is the correct relative alignment of structural elements. Accuracy should be in the order of some tens of nanometres. Some of the options for providing such accuracy are discussed. Examples are given of aligning defects with respect to a predefined 2D lattice, aligning access waveguides with respect to a small local photonic crystal structure, and the alignment of successive periodically structured layers in a 3D "woodpile" structure.

Keywords

focused ion beam technology; micromachining; optical elements; photolithography; photonic crystals; 2D lattice; 3D woodpile structure; FIB; access waveguides; accuracy; focused ion beam processing; laser interference lithography; mask-based lithography; periodically structured layers; photonic crystal device fabrication; photonic crystal structural alignment; Interference; Ion beams; Lattices; Lithography; Optical device fabrication; Optical waveguides; Periodic structures; Photonic crystals; Proximity effect; Slabs;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks, 2004. Proceedings of 2004 6th International Conference on

Print_ISBN

0-7803-8343-5

Type

conf

DOI

10.1109/ICTON.2004.1360289

Filename

1360289